CVD Equipment (NASDAQ:CVV) Shares Pass Above Two Hundred Day Moving Average – What’s Next?

CVD Equipment Corporation (NASDAQ:CVV)’s share price passed above its two hundred day moving average during trading on Wednesday . The stock has a two hundred day moving average of $3.51 and traded as high as $5.82. CVD Equipment shares last traded at $5.27, with a volume of 68,402 shares changing hands.

Analyst Ratings Changes

Separately, Weiss Ratings reiterated a “sell (e+)” rating on shares of CVD Equipment in a research note on Wednesday, January 21st. One analyst has rated the stock with a Sell rating, Based on data from MarketBeat.com, the stock presently has a consensus rating of “Sell”.

CVD Equipment Trading Down 6.9%

The firm has a market cap of $36.57 million, a P/E ratio of -263.37 and a beta of 0.89. The business’s 50-day moving average is $3.66 and its two-hundred day moving average is $3.51.

CVD Equipment (NASDAQ:CVV) last issued its earnings results on Monday, November 10th. The industrial products company reported $0.06 EPS for the quarter. The company had revenue of $7.41 million during the quarter. CVD Equipment had a negative return on equity of 0.72% and a negative net margin of 0.66%.

Institutional Investors Weigh In On CVD Equipment

A hedge fund recently raised its stake in CVD Equipment stock. Dimensional Fund Advisors LP raised its stake in CVD Equipment Corporation (NASDAQ:CVV) by 5.2% during the third quarter, according to its most recent disclosure with the SEC. The fund owned 71,689 shares of the industrial products company’s stock after buying an additional 3,556 shares during the quarter. Dimensional Fund Advisors LP owned approximately 1.04% of CVD Equipment worth $241,000 as of its most recent SEC filing. Hedge funds and other institutional investors own 31.59% of the company’s stock.

About CVD Equipment

CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.

The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis.