CVD Equipment Corporation (NASDAQ:CVV – Get Free Report)’s share price crossed above its 200-day moving average during trading on Tuesday . The stock has a 200-day moving average of $4.50 and traded as high as $6.68. CVD Equipment shares last traded at $6.01, with a volume of 136,952 shares trading hands.
Analyst Ratings Changes
A number of research firms have recently weighed in on CVV. Wall Street Zen downgraded CVD Equipment from a “hold” rating to a “sell” rating in a research note on Saturday, April 4th. Weiss Ratings reissued a “sell (d-)” rating on shares of CVD Equipment in a research note on Friday. One research analyst has rated the stock with a Sell rating, According to MarketBeat, the stock has a consensus rating of “Sell”.
CVD Equipment Trading Down 2.8%
Institutional Trading of CVD Equipment
A number of institutional investors and hedge funds have recently modified their holdings of CVV. Dimensional Fund Advisors LP increased its stake in shares of CVD Equipment by 5.2% in the 3rd quarter. Dimensional Fund Advisors LP now owns 71,689 shares of the industrial products company’s stock valued at $241,000 after acquiring an additional 3,556 shares during the last quarter. Citadel Advisors LLC increased its position in shares of CVD Equipment by 93.6% in the 3rd quarter. Citadel Advisors LLC now owns 41,382 shares of the industrial products company’s stock valued at $139,000 after buying an additional 20,011 shares in the last quarter. DRW Securities LLC bought a new stake in shares of CVD Equipment in the 4th quarter valued at $45,000. Finally, Renaissance Technologies LLC increased its position in shares of CVD Equipment by 17.5% in the 1st quarter. Renaissance Technologies LLC now owns 180,882 shares of the industrial products company’s stock valued at $749,000 after buying an additional 27,000 shares in the last quarter. 31.59% of the stock is owned by institutional investors.
CVD Equipment Company Profile
CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.
The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis.
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