CVD Equipment (NASDAQ:CVV) Raised to “Hold” at Wall Street Zen

CVD Equipment (NASDAQ:CVV) was upgraded by stock analysts at Wall Street Zen to a “hold” rating in a research report issued on Saturday.

Separately, Weiss Ratings reaffirmed a “sell (e+)” rating on shares of CVD Equipment in a report on Wednesday, January 21st. One analyst has rated the stock with a Sell rating, Based on data from MarketBeat, CVD Equipment presently has a consensus rating of “Sell”.

CVD Equipment Price Performance

Shares of CVD Equipment stock opened at $3.34 on Friday. CVD Equipment has a 1 year low of $2.46 and a 1 year high of $5.86. The firm has a market cap of $23.18 million, a PE ratio of -166.92 and a beta of 1.01. The company has a 50 day simple moving average of $4.20 and a two-hundred day simple moving average of $3.68.

Institutional Investors Weigh In On CVD Equipment

A number of institutional investors have recently made changes to their positions in CVV. Dimensional Fund Advisors LP lifted its stake in CVD Equipment by 5.2% in the third quarter. Dimensional Fund Advisors LP now owns 71,689 shares of the industrial products company’s stock worth $241,000 after purchasing an additional 3,556 shares during the last quarter. DRW Securities LLC bought a new position in shares of CVD Equipment during the fourth quarter valued at about $45,000. Finally, Citadel Advisors LLC grew its stake in shares of CVD Equipment by 93.6% during the third quarter. Citadel Advisors LLC now owns 41,382 shares of the industrial products company’s stock valued at $139,000 after buying an additional 20,011 shares during the last quarter. Hedge funds and other institutional investors own 31.59% of the company’s stock.

About CVD Equipment

CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.

The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis.